This experimental research project is focused on the study of the deposition by Aerosol Assisted Metal Organic Chemical Vapour Deposition (AA-MOCVD) of doped copper (I) oxide, Cu2O, thin films. Among the semiconducting compounds, copper oxide present the most promising electrical, optical and productive features that establish this material suitable as p-type semiconductor. In literature many materials with the required properties are been reported, among them transparent conductive oxide (TCOs) are the most widely used. The developed TCOs are mainly n-type semiconductors, but there is still a lack of p-type TCOs. For this reason, this research is focused on the growth of a p-type transparent conductive oxide.