Reliability and Diffusion Study at the Interface Between Thermoelectric Semiconductors and Electrode Metals with Barrier Materials
Daniele Micucci
Reliability and Diffusion Study at the Interface Between Thermoelectric Semiconductors and Electrode Metals with Barrier Materials.
Rel. Stefania Specchia, Tohru Sugahara. Politecnico di Torino, Corso di laurea magistrale in Ingegneria Chimica E Dei Processi Sostenibili, 2024
