ASML plays a central role in the global semiconductor industry as the leading supplier of advanced lithography systems used in the high-volume manufacturing of integrated circuits. In particular, ASML’s Extreme Ultraviolet (EUV) lithography technology has enabled the continuation of device scaling by allowing the patterning of features at nanometer length scales. EUV systems operate under ultra-high vacuum conditions and require extremely stringent contamination control to maintain optical performance and patterning accuracy. Even trace amounts of residual gases or contaminants can adversely affect critical system components, making the understanding and control of gas dynamics and contaminant transport within EUV environments a key technological challenge.