Thermal laser process of thin silicon carbide deposited by PECVD
Francesco Iozzi
Thermal laser process of thin silicon carbide deposited by PECVD.
Rel. Luciano Scaltrito, Sergio Ferrero. Politecnico di Torino, Master of science program in Nanotechnologies For Icts, 2024
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Abstract
Processo Termico Laser di Silicon Carbide depositato in film sottile
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