Combinatorial thin-film deposition is an innovative technique for the synthesis and discovery of new materials, designed to efficiently explore a wide range of compositions and process parameters. This is a technique widely used in various areas of chemical engineering to create nanometer-thick layers of material on a substrate. Research teams from Ben-Gurion University of Negev (Beersheva, Israel) and the Polytechnic of Turin recently collaborated to study combinatorial in-flow deposition of thin films, publishing the results in the paper “A Combinatorial Approach for the Solution Deposition of Thin Films.” The research offers a combinatorial method for the deposition of thin films from solution that allows two crucial parameters - temperature and deposition time - to be examined simultaneously on a single sample.