This thesis work is the result of a partnership between ChiLab-Materials and Microsystems Laboratory (Politecnico di Torino) in Chivasso and the Institute of Materials for Electronics and Magnetism (IMEM) at the National Research Council (CNR) in Parma. In the first part, the fabrication process was done, by realizing the devices through standard cleanroom procedures, such as metal deposition, etching and photolithography. The devices layout was improved, so that the total number of devices per single die passed from 8 to 16. Three different channel sizes were considered: this choice was important to evaluate the behavior of memristors with different channel aspect ratio.