Denis Salvador
Characterization of amorphous silicon carbide thin films recrystallization.
Rel. Luciano Scaltrito. Politecnico di Torino, Corso di laurea magistrale in Ingegneria Dei Materiali, 2021
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Abstract
The peculiar feature that nowadays accompanies our society, and consequently our lives, is definitely the technological progress in all kinds of sectors. The utilisation of innovative materials is an important step in evolution though the optimal exploitation of their properties in specific applications. Clearly, this is made possible by developments in the technological and production processes inherent in this major field of research. Among the modern semiconductor materials, silicon carbide (SiC) certainly plays an important role due to its unique chemical, physical and mechanical properties, making it ideal for various fields of application. However, the high cost of producing this material nowadays severely limits its use.
Scientific research is moving towards finding solutions to solve, or at least minimise, this challenge; the idea developed in this work, is to deposit silicon carbide at lower temperatures (300°C, 500°C and 750°C) than conventional processes
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