Metal-organic frameworks (MOFs) are an interesting class of self-assembled hybrid materials that are gaining more and more interest in several fields thanks to the tunable porosity and bandgap, mechanical and chemical stability, and low dielectric constant. MOF thin films are particularly interesting for applications such as microelectronics, gas sensing and filtration, photovoltaics, and catalysis. However, these applications are not always compatible with the wet-based chemistries typically used. Therefore, gas-based approaches such as CVD and ALD/MLD represent valid solutions. Nevertheless, Atmospheric Pressure Spatial Molecular layer deposition (AP-SMLD) could represent a faster and easier approach for the direct growth of MOF thin films, but it must be optimized yet.