DUV Lithography for UHF resonators
Federico Peretti
DUV Lithography for UHF resonators.
Rel. Carlo Ricciardi, Guillermo Villanueva. Politecnico di Torino, Corso di laurea magistrale in Nanotechnologies For Icts (Nanotecnologie Per Le Ict), 2022
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Abstract
The key concept related to the most impressive advancement in terms of technology in the recent past is related to the concept of miniaturization. In fact, scaling down the device dimensions, it is possible to explore many different additional application respect to the macro scale. This possibility has led to the realization of Microelectromechanical systems (MEMS) and Nanoelectromechanical systems (NEMS) which corresponds to devices whose dimensions are, respectively, in the micron or nanometer range. These kind of devices are not only smaller, they often exhibit better performances or allow additional opportunity compared to their bigger counterparts. These reasons explain why MEMS are capturing the research effort in many field such as automotive, medical, communications defense and aerospace.
Putting the focus on the communication market, it is in strong development due to growing need of high connectivity, fast exchange and quantity of data
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