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Thermal laser process of thin silicon carbide deposited by PECVD

Francesco Iozzi

Thermal laser process of thin silicon carbide deposited by PECVD.

Rel. Luciano Scaltrito, Sergio Ferrero. Politecnico di Torino, UNSPECIFIED, 2024

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Abstract:

Processo Termico Laser di Silicon Carbide depositato in film sottile
Relators: Luciano Scaltrito, Sergio Ferrero
Academic year: 2023/24
Publication type: Electronic
Number of Pages: 97
Subjects:
Corso di laurea: UNSPECIFIED
Classe di laurea: New organization > Master science > LM-29 - ELECTRONIC ENGINEERING
Aziende collaboratrici: UNSPECIFIED
URI: http://webthesis.biblio.polito.it/id/eprint/31007
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