Development and Characterization of Multicomponent Thin Films on Silicon Substrates for Nuclear Applications

The development of advanced materials capable of withstanding extreme environments is a crucial challenge for next-generation nuclear systems. In this work, multicomponent thin films were deposited on silicon substrates and analyzed with the aim of improving their structural and mechanical stability under irradiation. The study focuses on the design proposed by Professor Murakami, which involves a tailored multilayer configuration intended to enhance radiation tolerance and reduce defect accumulation. The films were synthesized using a Physical Vapor Deposition (PVD) technique and subsequently characterized through a combination of optical microscopy, Scanning Electron Microscopy (SEM), and nanoindentation analysis to evaluate their morphology, surface roughness, and mechanical properties. The results revealed that the specific multilayer design can influence film compactness and hardness, indicating potential advantages for nuclear applications where resistance to radiation-induced damage is required. Overall, this research provides new insights into the role of film architecture in determining the performance of protective coatings for nuclear materials, contributing to the ongoing development of durable and radiation-resistant surface technologies.